An investigation of polysilicon deposition techniques for non-standard substrates

Polysilicon films on non-silicon substrates are required for a wide range of applications, including large area electronics. A large area CVD system compatible with cluster tool type processing has been developed. A single-chamber multiprocess system has been developed which has the capability of performing multiple sequential process steps. This paper describes the two cold walled, low pressure CVD systems and presents results on the characterisation of the films produced.<
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