Electrochemical process for the lamination of magnetic cores in thin-film magnetic components

The lamination of the core in thin film magnetic components is necessary to reduce the eddy current losses of the structure at high frequencies. The usual way to achieve lamination of the core is by physical vapor deposition (PVD) techniques. These methods are however costly and the deposition of layers is non selective. In this article, an almost entirely aqueous-based electrochemical process for the lamination of magnetic cores is presented. The process uses an electrodepositable photoresist Eagle 2100 ED codeposited with a catalyst (palladium). The Eagle layer is left as an insulator and the catalyst allows the activation of the layer for subsequent metallization. The process can be reproduced as many times as required for producing the multilayers. It is also selective: it does not require multiple photolithography steps. As a demonstration of the multilayer process, a core constituted of two layers of Ni/sub 80/Fe/sub 20/ (6 /spl mu/m each layer), separated by an Eagle insulating layer, electroplated over three-dimensional structures, was produced.