GHGs reduction using the catalytic gas decomposition system

The GHG emission reduction activity for the semiconductor factory has been described. As a result of the C
₂
F
₆
gas and SF
₆
gas emission reduction countermeasures taken, the total GHG emissions could be reduced by 51% compared with 1995. The catalytic gas decomposition system was installed for SF
₆
gas, which was emitted from tungsten etching chamber. The SF
₆
gas decomposition ratio has been maintained at over 99.9% for one year. Regarding the degradation of the catalytic gas decomposition system (due to tungsten etching process by-products), analysis indicates that the dry trapping equipment introduction improved the maintenance interval by more than one year. As a result, a low running cost could be achieved