The effect of channel implants on MOS transistor characterization

MOS device characterization involves the extraction of parameters from electrical measurements. A nonuniform channel doping profile can make such characterization ambiguous since device parameters are usually based upon a uniform doping profile model. In this paper, we solve the one-dimensional Poisson's equation for several doping profiles and show the impact of a nonuniform doping profile on the threshold surface potential, threshold voltage, normal field mobility degradation, and transconductance.