MOSFET's in electron-beam recrystallized PolySilicon

MOSFET's have been fabricated in polysilicon films recrystallized by scanned, cw electron-beam heating. The structure of the polysilicon is similar to the large-grain structure formed by cw laser recrystallization, and no significant differences were seen between the characteristics of transistors in material recrystallized by the two different types of heating.