Graphical design and iterative analysis of the DC parameters of GaAs FET's

Two-dimensional numerical solutions of Poisson's equation and the carrier continuity equation for the short-gate GaAS field-effect transistor structure have been used to predict device performance. However, a generally accepted simplified approach to FET design has not evolved. In this paper, a simplified design technique and an iterative device analysis procedure are presented for application to GaAs FET's with gate lengths as small as 1 µm. The design technique makes it possible to determine drain saturation current and saturation transconductance for any gate size by simply scaling the appropriate curves for an FET with a 1-µm gate. Curves are also presented that relate the effective transconductance to the intrinsic transconductance for any FET geometry. The iterative analysis procedure makes it possible to determine the doping, N
D
, and thickness, a, of the epitaxial layer on which the device is fabricated. By simply measuring drain current and transconductance at zero gate bias and the pinchoff voltage, a method is presented which allows the epi parameters to be determined in a self-consistent fashion. This technique provides a way of mapping N
D
and a over a slice, as opposed to the usual technique of simply measuring pinchoff voltage (only gives N
D
.a
²
product variations).