Surface modification of ptfe by synchrotron radiation under the O/sub 2/ gas atmosphere

Polytetrafluoroethylen (PTFE) is known as the superior material in the many applications by taking advantages of its several excellent properties, such as thermal and chemical stabilities, bw surface energy and high resistivity. For the purpose of the extension of application to furthermore industrial yields, the surface modification of PTFE has been explored by several methods, such as low-temperature plasma processing, chemical adsorption and so on. Synchrotron radiation (SR) process was known to perform direct etching of PTFE with a high aspect ratio.'-3) However, the effect of the SR irradiation on the surface of PTFE film has not been understood. In the previous work, our group succeeded in controlling the wettability of the PTFE surface ranging from hydrophilic to hydrophobic using SR irradiation to PTFE surface by changing substrate temperature