UV nanoimprint lithography using a large area stamp in a low vacuum environment

Among several nanofabrication methods such as extreme ultraviolet (EUV) lithography, Mask-less lithography(ML2), nanoimprint lithography (NIL), etc., NIL is known as a low-cost method of fabricating nano-scale patterns as small as 6 nm [l]. In general, NIL can be classified into two types: thermal type NIL and ultraviolet nanoimprint lithography (UV-NIL) [2-61. UV-NIL is performed at low pressure and room temperature, while thermal type NIL [I] requires high pressure and elevated temperature.