Resolution in nanofabrication by electron-beam induced deposition combined with low energy ion milling

Beam induced deposition is a versatile technique for the fabrication of nanostructures. In it, a precursor gas, such as tungsten carbonyl, is introduced at the sample position, and is decomposed by a focused beam at an irradiated region only. Currently in wide use, a focused ion beam now makes possible the fabrication of complex structures such as actuators, switches and manipulators at less than α the micrometer scale 1-3.