Proposal of large exposure area and wide dimensional X-ray lithography for liga process using energy variable synchrotron radiation

There have been rapid evolution in the application of microsystems to the advanced industry such as intclligent information system, energy and environment conservation and medical and biochemical services, These microsystem consists from the different kinds of the micro parts such as mechatronics, optics, and fluidics, which has 3D microstructures with individual functions. The LIGA (abbreviated name of Lithographite, Galvanofonnung and Abformung) process which consists from deep x-ray lithography, electroforming, and molding processes is one of the promising candidates for such 3D microfabrication .