Resist elution study for immersion lithography

The immersion lithography has recently been refocused as an attractive approach to extend the current capabihty of 193nm lithography. Simultaneously, the compatibilitv of the current 193nm resist platform have been aggressively investigated. Although the acrylic resists presented superior resistance and very less changes in water fluid, it was confmed that the elusion amount of resist components with low molecular weight or high polarity was calculated to be a few percentage order of the original amount in resist film.