Microstructure of nanocrystalline titanium dioxide thin films deposited on silicon

In present paper results of structural investigations of thin films of titanium dioxide (TiD;) manufactured by modified magnetron sputtering process have been outlined XRD studies have shown that application of monocrystalline silicon wafers ensured fabrication of thin films with a high quality nanocrystalline structure with average size of grains in the range of (20 -i- 50) nm. It was stated that thin films fabricated by the modified method of magnetron sputtering were contracted at some preferred directions.