Extraction of substrate parameters for RF MOSFETs based on four-port measurement

In this work, a new method for extracting substrate parameters of radio frequency (RF) metal oxide semiconductor field effect transistors (MOSFETs) based on four-port measurement is presented. A T-liked substrate resistance network is used and the values of all components in the cold MOSFETs were extracted directly from the four-port data between 250 MHz and 8.5 GHz. The output admittance Y/sub 22/ can be well modeled up to 26.5 GHz based on the extracted substrate resistances and the other extrinsic capacitances extracted from an active device.