A computational intelligent optical proximity correction for process distortion compensation of layout mask in subwavelength era

In this work, the authors develop an intelligent OPC approach which combines the genetic algorithm (GA), the rule-based technique, and conventional model-based correction method to perform the mask correction in subwavelength era. Basic idea is that the GA and the lithography simulator is applied to find out the best size and position for a complete layout with those additional patterns which generated by rules.