Intentionally inserted oxygen depleted (Ba/sub 0.5/Sr/sub 0.5/)TiO/sub 3/ layers as a model of DC-electrical degradation

The relative dielectric constant versus voltage (/spl epsiv//sub r/-V) characteristics and the current density versus electric field (J-E) characteristics of (Ba/sub 0.5/Sr/sub 0.5/)TiO/sub 3/ films, which have intentionally inserted oxygen depleted layers near the bottom electrodes, were investigated as a model of dc-electrical degradation phenomena. Our investigation demonstrated that the intentionally inserted oxygen depleted layer is the cause of the tunneling conduction.