Semiconductor-film grafting-a new approach to OEICs

The use of semiconductor-film grafting for the hybrid integration of optoelectronic devices and its advantages in post-transfer fabrication are described. It is shown that grafted films are optically coupled to the substrate, making it possible to mix the semiconductor properties with some properties in the substrate, not commonly found in semiconductors, to yield new devices with no counterpart in other technologies. The semiconductor-film grafting, device fabrication, optical interaction between the semiconductor film and host substrate, and the integration of lasers with glass and LiNbO/sub 3/ waveguides are discussed.<
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