Coupling and crosstalk between high speed interconnects in ultralarge scale integrated circuits

The advent of sophisticated lithographic techniques has made it possible to fabricate densely packed ultra-large-scale-integrated (ULSI) circuits. In these chips, interconnect lines are so narrow and spaced in such close proximity that signal from one line could easily get coupled to another, causing interference and crosstalk. A general theory to model coupling between optical interconnects (waveguides) and quantum-mechanical coupling between narrow and very closely spaced silicide interconnects embedded in dielectrics (SiO/sub 2/) is presented.<
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