Photolithographically patterned thin-film multilayer devices of YBa/sub 2/Cu/sub 3/O/sub 7-x/

Thin-film YBa/sub 2/Cu/sub 3/O/sub 7-x/-SrTiO/sub 3/-YBa/sub 2/Cu/sub 3/O/sub 7-x/ multilayer interconnect structures in which each in situ laser-deposited film is independently patterned by photolithography have been fabricated. The two key components necessary for a superconducting multilayer interconnect technology have been constructed: crossovers and window contacts. As a further demonstration of the technology, the authors have fabricated a thin-film flux transformer which is suitable for use with a superconducting quantum interference device (SQUID) and includes a ten-turn input coil with 6- mu m linewidth. Transport measurements showed that the critical temperature was 87 K and the critical current was 135 mu A at 82 K.