Vertically laminated magnetic cores by electroplating Ni-Fe into micromachined Si

The fabrication and characterization of vertically laminated, electrodeposited Ni-Fe magnetic cores in micromachined silicon for the low megahertz frequency range is presented. Laminated cores were fabricated by etching vertical trenches (60-180 /spl mu/m wide and 525 /spl mu/m deep) through silicon wafers and directly plating Ni-Fe onto the etched sidewalls. The Ni-Fe was plated over a range of thicknesses (3-53 /spl mu/m) in order to study the influence of eddy currents. The measured impedances in the range 10 kHz-40 MHz confirm the reduction of eddy current losses. This work demonstrates a simple fabrication method for achieving high-aspect-ratio, vertically laminated magnetic cores where the geometry of the structures can be easily tailored for various applications.