Improved yields for the nano-technology era using cryogenic aerosols

In this paper, cryogenic aerosol processing for enhancing final device yield in state-of-art 180 and 130 nm devices is demonstrated. Significant advantages of this particle removal technology is demonstrated and discussed: excellent particle removal efficiency on both hydrophilic and hydrophobic surfaces, no watermarks, no feature damage, no charge induced damage and no film modification or loss.