Temperature dependence and silane consumption during particle formation in Ar-silane RF capacitively coupled plasma

We propose a generalized model, based on a simple balance equation, explaining the temperature dependence of the agglomeration time of nanoclusters in Ar-SiH/sub 4/ plasmas. This model allows easy incorporation of specific mechanisms and verification of their effect on particle growth. We consider extra silane consumption due to back diffusion, an important issue for the laboratory plasma experiments and modeling results interpretation.