Studies on the mechanism of high resolution and high aspect ratio in DFVP

Development-free vapor photolithography (DFVP) is a unique all-dry pattern transfer technique with many advantages such as superior quality, high aspect ratio and high resolution. This paper analyzes the mechanism of the DFVP and proposes a theory model to explain the cause of its advantages. Experiments are designed and carried out, the result shows the polymer is the main factor affecting the resolution and aspect ratio of the pattern.