Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process

This paper describes a new simple process model for photoresist development. The model includes the consideration of chemical reactions between a photoresist and a developer, and takes the developer concentration dependence into account. The model is applied to the design of practical photo-lithography processes to determine development conditions. Through the introduction of the model-based lithographic simulations, the multilayer resist process has been successfully designed and has obtained satisfactory patterns.