Photonic device fabrication inside transparent materials by tailored femtosecond laser processing

In this paper, we report on the photonic device fabrication inside silica glasses by loosely focused fs laser under the conditions of incident pulsewidth of 150 fs, incident energy of 15 /spl mu/J and effective NA of 0.007 and laser irradiation time of 10 min for each line. Diffraction gratings of 10 /spl mu/m period and waveguide splitters were fabricated by fs laser. We employed a pulsewidth tunable fs laser system based on CPA architecture which we developed and we will discuss optical properties of the fabricated devices.