Growth of sputtered AlN thin film on glass in room temperature

Highly [002] oriented AlN thin film is deposited on glass substrate by RF magnetron sputtering method. The X-ray diffraction shows that the AlN thin film has grown in a preferred [002] orientation but other orientation starts to build up as the thickness increases. The surface morphology of the c-axis texture of the AlN thin film is obtained by scanning electron microscopy. The d/sub 33/ coefficient of the AlN thin film is measured using piezoresponse microscopy and the result obtained is 3.8pm/V.