Electron optics properties on EB stepper

Nikon has been developing electron projection lithography (EPL), which is eminently suitable for 65nm node technologies and beyond. The electron optics (EO) sub-system, which has been collaborated with IBM and Nikon's original stage/body, have been integrated into the "EB Stepper". We discuss the following EO properties:- 1. Resolution (deflected sub field and on axis sub fleld) 2. Distortion including sub field distortion (within 250μm square area) and main fleld distortion and 3. Stitching (between subfields).