Nano-lithography using self-assembled block-copolymer for patterned media

Block-copolymers are known to generate nano-scale microdomains by microphase-separation, if they are annealed at a temperature lower than their order-disorder transition temperatures. We tried to transfer microdomains onto substrates by only using the reactive-ion etching method, which is widely used in semiconductor manufacturing processes. Regarding the application of this nano-patterning technique, we demonstrated the first circumferential magnetic patterned media for hard disk, which were prepared on a 2.5-inch diameter glass plate.