Line edge roughness characterization using nanotubed-AFM and SEM

We report the results of line edge roughness (LER) characterization using atomic force microscopy with carbon nanotube (AFM-CNT) and high resolution scanning electron microscopy (SEM). UV-6 has been exposed using next generation lithography (NGL) tools such as extreme ultra-violet (EUVL), electron beam (EBL), and X-ray (XRL). Then the LER behaviors were compared using AFM-CNT and SEM as metrology tools and we conclude that metrology tools should be selected more carefully for specific applications.