A resistively stabilized XeCl laser operating at 200 Hz

We have explored the feasibility of stabilizing the discharge of a high repetition rate XeCl laser by providing distributed resistive ballasting of one of the transverse electrodes in the form of an array of resistive pins. This technique has enabled us to demonstrate operation of the laser at a (power supply limited) pulse repetition frequency of 200 Hz in a device which did not require forced circulation of the gas mixture.