Growth and characterization of 1.3 µm CW GaInAsP/InP lasers by liquid-phase epitaxy

The variation of the threshold current density and its temperature dependence with acceptor concentration in GaInAsP/InP lasers emitting at 1.3 μm is described. Mechanisms responsible for the dependence are identified. A model is developed to predict the effect of the above dependence on the CW operation range of these devices. The validity of the model is verified experimentally.