Poly I/sup 2/L-a high-speed linear-compatible structure

Poly I/SUP 2/L a new bipolar process technology, is presented featuring 5 ns minimum propagation delay, 24 MHz flip-flop operation (using 10 /spl mu/ minimum feature size), and 15-30 V isolated and unconstrained linear circuit transistors on 5 /spl Omega/.cm epitaxy. Standard linear integrated circuit process complexity is increased by only one mask without extra diffusions.