A comparative study of CoZrNb and NiFe targets in discharge and sputtering using plasma confining type of magnetron sputtering method

CoZrNb and NiFe films have been deposited by a plasma-confining type magnetron sputtering method which can greatly improve the utilization efficiency of a magnetic alloy target with high permeability and completely suppress the bombardment of the substrate by high-energy gamma -electrons. Applying an auxiliary solenoid magnetic field H/sub E/ perpendicular to the target plane improved the target utilization efficiencies in volume for CoZrNb and NiFe targets from 32 to 51% and from 25 to 41%, respectively. In both targets, the maximum deposition rates were above 0.2 mu m/min. All CoZrNb films deposited by this method were composed of FCC-phase crystallites with the NiFe