Implementation of a fuzzy-PI controller for a pulsed plasma nitriding power source

The pulsed plasma nitriding process is widely used nowadays in the treatment and hardening of metallic components. But the voltage regulation on the nitriding chamber, although necessary, is hard to be done, because it depends on the components' dimensions, on pulse's width and on the unstable nature of plasma. Taking this in account, this work proposes the use of a fuzzy-PI controller on the nitriding power source to provide a versatile control, allowing a good voltage regulation under different operational points, i.e. for distinct chamber conditions.