Temperature dependence of hot-carrier-induced degradation in 0.1 μm SOI nMOSFETs with thin oxide

This letter investigates hot-carrier-induced degradation on 0.1 μm partially depleted silicon-on-insulator (SOI) nMOSFETs at various ambient temperatures. The thermal impact on device degradation was investigated with respect to body-contact nMOSFETs (BC-SOI) and floating-body SOI nMOSFETs (FB-SOI). Experimental results show that hot-carrier-induced degradation on drive capacity of FB-SOI devices exhibits inverse temperature dependence compared to that of BC-SOI devices. This is attributed to the floating-body effect (FBE) and parasitic bipolar transistor (PBT) effect.