Improving Charge Carrier Transport Properties in AlGaN Deep Ultraviolet Light Emitters Using Al-Content Engineered Superlattice Electron Blocking Layer

In this study, we investigate a unique Al-content engineered superlattice electron blocking layer (AESL-EBL) for improving the charge carrier transport properties of AlGaN quantum well (QW) deep ultraviolet (DUV) light-emitting diode (LED) structures. LED structures without EBL, with conventional bulk EBL (BEBL), and superlattice EBL (SL-EBL) are used for comparison. It is found that the LED structure with the AESL-EBL can exhibit superior electron blocking and hole injection, leading to reduced efficiency droop and improved light output power, compared to LED structures without EBL and with BEBL. Notably, the LED structure with AESL-EBL also outperforms the LED structure with SL-EBL, benefitting from the Al-content engineered SL. In the end, such an ASEL-EBL is applied to a DUV laser diode structure, and by optimizing the device structure low Mg-induced internal loss of around 1 cm−1 can be obtained.