A simple model for ultra-low specific contact resistivity metal- interfacial layer -semiconductor contacts

A simple, physics-based model is developed for study of ultra-low specific contact resistivity metal-interfacial layer-semiconductor (M-I-S) contacts. Reduction in metal induced gap states (MIGS) density and Fermi level de-pinning in metal-semiconductor interface reduce the Schottky barrier height (SBH). Be coupled with electron transport model, the specific contact resistivity in different M-I-S system can be calculated.