Development of large-scale inductively coupled plasma source with multiple internal antennas units for synthesis of microcrystalline silicon films

The authors propose an internal-antenna configuration with multiple low-inductance antenna (LIA) units for production of large-scale high-density ICPs, providing low-voltage operation. Microcrystalline silicon films were grown on glass substrates using silane (SiH/sub 4/) and hydrogen (H/sub 2/) mixture plasmas at a substrate temperature below 773K. The deposited films showed the crystalline phase formation with Raman intensity ratio as high as 8. Relatively uniform distribution is achieved over the large-area substrate.