AlGaN/GaN HFETs on Si Substrates for WiMAX Applications

AlGaN/GaN HFETs on Si substrates are tested under OFDM modulations and show excellent performance from 3.3GHz to 3.8GHz. Performance on an 8mm device (NPT35010) in power small outline package (PSOP2) shows 1.5W output power, 11.2dB gain, 28.6% drain efficiency and 2% EVM at 3.5GHz. Large periphery 36mm devices were mounted in ceramic packages (NPT35050) and showed greater than 7W output power, > 11dB gain, 27.2% drain efficiency and 2% EVM at 3.5 GHz. Additionally data was taken across process from 23 devices and 5 process lots to demonstrate repeatability. Finally the same RF data was collected over flange temperature from -40degC to +85degC and demonstrated stable performance over temperature. These results demonstrate the potential for GaN-on-Si HEMTs for use in WiMAX applications