Integrated thin film magneto-impedance sensor head using platingprocess
Takayama, A.; Umehara, T.; Yuguchi, A.; Kato, H.; Mohri, K.; Uchiyama, T.
Magnetics, IEEE Transactions on
Volume 35, Issue 5, Sep 1999 Page(s):3643 - 3645
Digital Object Identifier   10.1109/20.800617
Summary:An integrated thin film MI (magneto-impedance) sensor head constructed with a combination of a thin film NiFe MI element and thin film bias and negative feedback coils using a micro-plating technology, has been developed in order to solve the problems of an amorphous wire MI head. The sensor head showed a very high field-detection sensitivity of about 0.41%/A/m (33%/Oe) magnetized with pulse current and a small hysteresis for the change of an external field. We have fabricated a differential type sensor module using a pair of the thin film MI sensor heads. The output voltage of the sensor has a good linearity within the range of ±80 A/m, and the voltage was 25mV/A/m(2.0V/Oe), and has small thermal drift within 0.1 A/m°C. The consumption power of the sensor module was 165 mW

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