Fabrication of a thin film micro polarization array
Gruev, V.; Kejia Wu; Van der Spiegel, J.; Engheta, N.
Circuits and Systems, 2006. ISCAS 2006. Proceedings. 2006 IEEE International Symposium on
Volume , Issue , 0-0 0 Page(s):4 pp. - 212
Digital Object Identifier   10.1109/ISCAS.2006.1692559
Summary:A thin film polarizer has been patterned and etched using reactive ion etching (RIE) in order to create 14 micron circular periodic structures. The polarization thin film has extinction ratio of 60dB in the blue and green visible spectrum and ~40db in the red spectrum. Various gas combinations for RIE has been explored and it has been experimentally determined that for a particular concentration of CF₄ and O₂ an optimum etching rate, in terms of speed and under-etching, is possible. Theoretical explanation for the optimum etching rate has been also presented. In addition, anisotropic etching with less then 0.5mum under cutting has been achieved. Experimental results of the patterned structures under polarized light are presented

» View citation and abstract

Log in by entering your IEEE Web Account Username and Password.

IEEE Communications Society members: If you subscribe to the IEEE Electronic Periodicals Package or IEEE Electronic Periodicals Package Plus, you must access your subscription at www.comsoc.org.

Check with your librarian, information professional, or system manager to determine if you need to log in. Please complete the online Technical Support Form if you need assistance.

Select the Purchase History link to access the document. You will have 5 Days after purchase to access the Full Text PDF. Please complete the online Technical Support Form if you need assistance.

• Search and access Abstract records free of charge
• Register for table of contents alerts
• Purchase Full Text PDF documents

» Learn more about subscription options or how to become an IEEE Member.