Circuit sensitivity to interconnect variation
Lin, Z.; Spanos, C.J.; Milor, L.S.; Lin, Y.T.
Semiconductor Manufacturing, IEEE Transactions on
Volume 11, Issue 4, Nov 1998 Page(s):557 - 568
Digital Object Identifier   10.1109/66.728552
Summary:Deep submicron technology makes interconnect one of the main factors determining the circuit performance. Previous work shows that interconnect parameters exhibit a significant amount of spatial variation. In this work, we develop approaches to study the influence of the interconnect variation on circuit performance and to evaluate the circuit sensitivity to interconnect parameters. First, an accurate interconnect modeling technique is presented, and an interconnect model library is developed. Then, we explore an approach using parameterized interconnect models to study circuit sensitivity via a ring oscillator circuit. Finally, we present an alternative approach using statistical experimental design techniques to study the sensitivity of a large and complicated circuit to interconnect variations

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