Automated malfunction diagnosis of semiconductor fabricationequipment: a plasma etch application
May, G.S.; Spanos, C.J.
Semiconductor Manufacturing, IEEE Transactions on
Volume 6, Issue 1, Feb 1993 Page(s):28 - 40
Digital Object Identifier   10.1109/66.210656
Summary:A general methodology for the automated diagnosis of integrated circuit fabrication equipment is presented. The technique combines the best aspects of quantitative algorithmic diagnosis and qualitative knowledge-based approaches. Evidence from equipment maintenance history, real-time tool data, and incline measurements are integrated using evidential reasoning. This methodology is applied to the identification of faults in the Lam Research Autoetch 490 automated plasma etching system located in the Berkeley Microfabrication Laboratory

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